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Comparison Betweeen Measured and Modeled Relative Quantum Efficiency at Energies above 5 keV

  At energies above 4-5 keV quantum efficiency of the device depends entirely on the depletion depth. Consequently, the results of the depletion depth measurements described in Section 4.6.2 can be used to verify the results of the QE measurements of the flight devices relative to the reference chips. Since depletion depths were extracted from the data taken in the HIREFS chamber, the results of the two measurements are completely independent. Absolute QE numbers at two energies - 5.898 KeV (Manganese $K_{\alpha}$ line) and 8.047 keV (Copper $K_{\alpha}$ line) were calculated for both flight and reference devices based on the assumption that any photon interacting within the depleted layer will be detected. Table 4.7.5 shows the results of these calculations along with the results of the relative QE measurements in the big chambers. Both results are in good agreement.


 
Table 4.32: Comparison of relative QE measured directly and calculated from the results of depletion depth measurement
Device Loc. Depletion
Depth
($\mu m$)
Absolute QE
(calculated)
Relative QE
(calculated)
Relative QE
(measured)
Rel. QE difference
(meas. - calc.)
Reference Device
5.9 keV 8.05 keV 5.9 keV 8.05 keV 5.9 keV 8.05 keV 5.9 keV 8.05 keV
w203c4r I0 64-65 0.875 0.594 1.039 1.086 1.031 1.106 -0.008 0.02 w103c4
w193c2 I1 64-65 0.875 0.594 1.039 1.086 1.033 1.087 -0.006 0.001 w103c4
w158c4r I2 64-65 0.875 0.594 1.039 1.086 1.030 1.096 -0.009 0.01 w103c4
w215c2r I3 64-65 0.871 0.588 0.974 0.94 0.986 0.932 0.012 -0.008 w190c3
w168c4r S0 63-64 0.867 0.583 0.970 0.93 0.974 0.919 0.004 -0.011 w190c3
w182c4r S2 75-76 0.905 0.646 1.07 1.18 1.068 1.211 -0.002 0.031 w103c4
w457c4 S4 70-72 0.894 0.626 1.00 1.00 1.000 1.003 0.000 0.003 w190c3
w201c3r S5 71-72 0.894 0.626 1.00 1.00 1.001 1.008 0.001 0.008 w190c3
w103c4 ref 57 0.842 0.547              
w190c3 ref 71 0.894 0.626 1.062 1.145 1.058 1.211 -0.004 0.066 w103c4
mean
$\sigma$
  -0.0013
0.0066
0.013
0.023
 


next up previous contents
Next: Effects of Instrument Configuration Up: Relative Efficiency Measurements Previous: Release notes for the

Mark Bautz
11/20/1997